Nov 03, 2004

GE Infrastructure Water & Process Technologies Hosts Process Treatment Summit

More than 50 thought leaders from chemical processing and hydrocarbon processing facilities met with leaders from GE Infrastructure, Water & Process Technologies to discuss the emerging needs of the process industries. The two-day event featured focus groups to address how GE technology is solving the most critical needs facing plant managers and to develop roadmaps for future technology investment.

Participants in the summit met with GE leaders to ensure a collaboration moving forward. "Speaking directly and intimately with customers gives us the information our marketing and technology teams need to anticipate industry needs and to proactively create solutions. Really knowing and listening to your customers is the key to mutual growth," explained George Oliver, president and CEO of GE Infrastructure, Water & Process Technologies.

Scott Donnelly, senior vice president, GE Global Research provided the keynote address for the session, discussing GE's strategy for developing new technologies. Donnelly also presented a summary of the depth of technological advancements emanating from GE's Global Research Centers. GE reviewed several new technologies that have been developed for the chemical and hydrocarbon processing industries, including non-destructive testing technology adapted from GE's Healthcare and Transportation businesses.

GE conducted imagination sessions with the customers to determine how GE could impact their businesses through future technology developments. "This is the first supplier sponsored event that feels like a true partnership versus selling me something. I'm really impressed," explained Robin Stanley from BASF.

The final component of the summit included a tour of GE's Woodlands Global Research Center where researchers are focused on supporting GE's growing Process Treatments business and developing the next generation of prediction and detection technology that helps to assure operational performance.